Fast pump-down, high base pressure
Possible real leak, high outgassing, wrong gauge position, pump contamination or open gas path.
Pump-down, pressure rise, leak rate, effective pumping speed and gas-load acceptance.
| Check | Calculation / record | Acceptance question |
|---|---|---|
| Pump-down | P(t), V, pump configuration, valve state | Does the curve match the declared pumping system? |
| Pressure rise | Q = V·dP/dt | Is pressure rise compatible with leak/outgassing criteria? |
| Effective pumping | Seff-1 = Spump-1 + C-1 | Is speed at chamber sufficient, not only nominal pump speed? |
| Process gas | P ≈ Qgas/Seff | Can the system hold target pressure during gas flow? |
| Leak test | helium leak detector report | Are all ports, feedthroughs and seals verified? |
| Documentation | raw logs, calibration data, FAT protocol | Can the acceptance result be repeated and audited? |
| Record | Required content |
|---|---|
| Configuration | chamber volume, pump types, valve positions, gauges, gas lines, tested ports |
| Pump-down | pressure-time curve from atmosphere or defined start pressure |
| Ultimate pressure | gauge type, location, time at pressure, pump status |
| Pressure rise | isolated volume, start/end pressure, duration, calculated Q |
| Leak test | method, sensitivity, tested locations, acceptance criterion |
| Gas-flow test | gas type, flow rate, pressure, pumping mode, stability |
| Observed value | Possible physical source | Record needed | Weak conclusion to avoid |
|---|---|---|---|
| Slow pump-down | Conductance criterion, outgassing, contaminated surfaces, pump constraint. | Pump-down curve, chamber state, pump configuration. | Assuming a leak without isolation data. |
| Fast pressure rise | Real leak, virtual leak, outgassing or trapped volume. | Q = V · dP/dt, helium test, vent/bake history. | Using base pressure alone as acceptance. |
| High pressure under gas flow | Insufficient S_eff, conductance loss, local gas injection or gauge position. | Gas-flow calibration, pressure under flow, pumping path. | Empty-chamber vacuum means process readiness. |