Connected Public-20 companies
Advanced EnergyIHI Hauzer Techno Coating B.V.Pfeiffer VacuumTRUMPF Hüttinger
Patent families
US12503756B2
Industrial inner-surface coating apparatus: elongated plasma source, thermionic target/cathode, gas channel, optional auxiliary anode; hollow article can itself act as hollow cathode during cleaning.
— · Plasmateria GmbH
US20250347003A1
Duplex nanocomposite: PEMS plasma nitriding followed by Ti–Si–C–N nanocomposite coating in the same PVD device.
— · Southwest Research Institute (SwRI)
CN1412343A
Двойной катод — высокочастотное тлеющее ионное покрытие: оборудование и процесс
2002-03-18 · Taiyuan University of Technology
CN103320772B
Устройство и способ модификации внутренней поверхности металла
2013-07-04 · Dalian University of Technology
CN103952677B
Нанесение покрытия на внутреннюю стенку трубы электронно-усиленным плазменным разрядом
2014-05-12 · Beihang University
EP3400389B1
Coated vacuum-device components / turbomolecular-pump component coating, including NEG layer
2016-06-03 · Pfeiffer Vacuum Components and Solutions GmbH on grant
US12614706B2
Magnetron with controller for monitoring and control
2018-10-22 · Soleras Advanced Coatings BV
WO2024168346A1
PECVD reactors and plasma polymer deposition methods
2023-02-10 · Kayaku Advanced Materials Inc
WO2025124330A1
Magnetron forming method / magnetron sputtering device
2023-12-14 · Beijing NAURA Microelectronics Equipment Co., Ltd.
US12503758B2
Integrated surface preparation/passivation/ALD vacuum architecture
2024-04-03 · Comptek Solutions Oy
WO2026077222A1
Magnetron sputtering cathode/device/apparatus/coating method
2024-10-08 · Suzhou Maxwell Technologies Co., Ltd.