Plasma Diagnostics & Process Control

10 selected family record(s).

Patent families

CN104871430B

RF power / arc removal

— · TRUMPF Hüttinger

EP4095387B1

Scroll vacuum pump with integrated pressure sensing

— · Vacuum pump ecosystem

JP6730567B2

Plasma processing / self-bias control

— · AIST

US10266940B2

Tuner compensation in plasma processing

— · Applied Materials

US11978611B2

High-voltage waveform switching for plasma control

— · Advanced Energy ecosystem

WO2004020694A1

Substrate processor cleaning

— · Tokyo Electron

US11739847B2

Advanced vacuum process control

2017-10-30 · VAT Holding AG

US11867753B2

Micro-vacuum probe station

2019-05-07 · Nextron Corporation

WO2024126970A1

Welding system with X-ray imaging / closed-loop weld quality monitoring

2022-12-12 · Aquasium Technology Limited

WO2025058374A1

Gallium organometallic ALD/CVD precursor

2023-09-11 · Lake Materials Co., Ltd.