Remote plasma ALD with DC bias
— · Hanyang ecosystem
Remote-plasma self-cleaning CVD system
— · ASM
CVD/PECVD chamber and showerhead/process reactor branch
— · Applied Materials
Processing chamber cleaning
— · Applied Materials
ALD apparatus
— · Lam Research
Plasma vapor deposition
— · Veeco
Remote plasma ALD
— · PEALD ecosystem
Substrate processor cleaning
— · Tokyo Electron
ALD/CVD reactor heater-susceptor
2003-02-11 · Eugenus Inc.
Hafnium precursor / ALD-CVD thin film
2005-12-06 · Tri Chemical Laboratories Inc.
PECVD device/system/method
2020-09-15 · Centrotherm International AG
Plasma-enhanced CVD coating system
2022-04-16 · HZO entities
ALD molybdenum precursor
2022-09-20 · ADEKA Corporation
PECVD reactors and plasma polymer deposition methods
2023-02-10 · Kayaku Advanced Materials Inc
Fluorine-free hydrophobic thin-film coating
2023-03-24 · COTEC GmbH
Gallium organometallic ALD/CVD precursor
2023-09-11 · Lake Materials Co., Ltd.
Selective/cycle-by-cycle ALD system
2023-12-18 · Lotus Applied Technology, LLC
PEALD apparatus
2024-01-22 · Beneq Oy
Integrated surface preparation/passivation/ALD vacuum architecture
2024-04-03 · Comptek Solutions Oy
Reservoir precursor delivery for plasma-enhanced ALD
2024-09-18 · Applied Materials Inc
PECVD chamber / variable-thickness dielectric deposition
2024-09-20 · Tokyo Electron Ltd; IBM; Tokyo Electron US Holdings
Low-vapor-pressure ALD precursor gas supply
2025-03-11 · MNT Micro and Nanotech Co., Ltd.